Crecimiento de películas delgadas de nitruro de carbono por deposicion con láser pulsado


Authors

  • Henry Riascos
  • Lina Maria Franco
  • Jaime Andres Perez

Abstract

Hemos crecido películas delgadas de nitruro de carbono (CNx) mediante el Deposición por Láser Pulsado (DLP), usando como blanco grafito de alta pureza y como substrato silicio. Las películas fueron crecidas en un ambiente de gas de nitrógeno, variando la presión del gas, para dos valores de la fluencia del láser y dos valores de la temperatura del substrato. Estas películas fueron caracterizadas por Microscopia de Fuerza Atómica (AFM) y espectroscopia Raman. La rugosidad de las películas depende tanto de la presión del gas de trabajo como de la temperatura del substrato, sus estructuras son amorfas presentando los picos D y G, típicos de las estructuras tipo fulereno

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Published

2007-07-30

How to Cite

Riascos, H., Franco, L. M., & Perez, J. A. (2007). Crecimiento de películas delgadas de nitruro de carbono por deposicion con láser pulsado. Scientia Et Technica, 1(36). Retrieved from https://revistas.utp.edu.co/index.php/revistaciencia/article/view/4961

Issue

Vol. 1 No. 36 (2007)

Section

Mecánica

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