Efecto del voltaje de polarizacion en el sustrato de acero aisi m2 sobre algunas características de la monocapa tin depositada por la técnica papvd.
Abstract
El presente trabajo analiza el efecto del potencial de ionización del cátodo sobre las propiedades de dureza, adherencia, espesor, microestructura, fases y tensiones residuales presentes, en una monocapa de TiN obtenida por el proceso de deposición física en fase vapor asistida por plasma (PAPVD). Además establecer la relación existente entre estas propiedades y características del recubrimiento con los diferentes potenciales de polarización empleados. Las técnicas de caracterización de recubrimiento empleadas en el presente trabajo incluyen pruebas mecánicas de micro dureza y adherencia, análisis cristalográfico y morfológico, y determinación de tensiones residuales.Downloads
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