Propiedades de las Peliculas de TiN/TiC Crecidas por la Técnica de Arco Pulsado


Authors

  • DIANA MARCELA DEVIA NARVAEZ UNIVERSIDAD TECNOLOGICA DE PEREIRA
  • Harold Duque Sanchez UNIVERSIDAD TECNOLOGICA DE PEREIRA
  • Diego Fernando Devia Narvaez UNIVERSIDAD TECNOLOGICA DE PEREIRA

DOI:

https://doi.org/10.22517/23447214.8405

Keywords:

TiN/TiC, Interface, PAPVD

Abstract

Los recubrimientos de TiN/TiC fueron depositados por la técnica de Deposición Física en Fase de Vapor asistida por Plasma (PAPVD) por Arco Pulsado. Los recubrimientos fueron analizados por Espectroscopia de fotoelectrones de Rayos X (XPS) y Difracción de Rayos X (XRD). El tratamiento de la señal del espectro angosto XPS y los patrones XRD confirmaron la presencia de TiN (Nitruro de Titanio), TiC (Carburo de Titanio) y TiCN (Carbonitruro de titanio), con grupo espacial fm-3m, correspondiente a la fase FCC de los compuestos sintetizados.

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Published

2013-04-30

How to Cite

DEVIA NARVAEZ, D. M., Duque Sanchez, H., & Devia Narvaez, D. F. (2013). Propiedades de las Peliculas de TiN/TiC Crecidas por la Técnica de Arco Pulsado. Scientia Et Technica, 18(1), 280–284. https://doi.org/10.22517/23447214.8405

Issue

Vol. 18 No. 1 (2013)

Section

Bioingeniería

License

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